Cleanroom

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  • Shared facility of the TDSU 1 and TDSU 3
  • Temperature 21 ◦ C ±1K, Humidity 50%±10%
  • ISO class 5/6/7
  • Nanofabrication facilities: Labs for lithography, photochemistry, thin film deposition, and dry etching, as well as a chemistry lab with a dedicated area for working with hydrofluoric acid